Synthesis and characterization of nanocoatings thin films of TiO2, SiO2, ZnO, and CuO by sputtering deposition


Haitham M. Wadullah*, Omer Khalil Ahmed, Sohaib Hassan Mohammed


Engineering Technical College of Mosul/ Northern Technical University, Iraq

Technical Institute / Hawija, Northern Technical University, Iraq

Corresponding Author Email: dr.haitham@ntu.edu.iq, hai_moh2004@yahoo.com

This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

This work is aiming to synthesis and characterize of nanocoating thin films prepared by sputtering deposition at optimal conditions on various substrates. Magnetron sputtering deposition technique has been used to deposit nanocoating thin films of TiO2, SiO2, ZnO, and CuO on different substrates (stainless steel 316L, commercially pure Ti, Si-Wafer (100), and glass substrates). Surface morphology, crystal structure and size, and films elements deposited have been investigated using SEM, XRF, and XRD characterization technique respectively. From the findings of SEM photographs, the microstructure is uniform and the surface is free of defects or micro-cracks. The deposited thin films have a nanostructure and nanoparticle grain size of 60-90 nm, according to X-ray diffraction patterns. Also, all thin films have a crystal structure aligned in different directions matched to the standard phases peaks. The elements of each film deposit are specific objectives by the XRF peaks that are produced.